| 摘要: |
| 选用霜、乳、液3类化妆品为研究对象，考察高分子沉淀剂对HPLC法检测防腐剂过程中的抗基质
干扰效果。实验发现乙酸锌、亚铁氰化钾联合使用可有效去除霜、乳、液3类化妆品基质对防腐
剂测定的干扰，12种防腐剂的色谱峰峰型尖锐对称，无杂峰干扰，线性相关系数均大于0.999 9，
方法相对标准偏差小于2%，回收率为90%～104%。 |
| 关键词: 化妆品 防腐剂 高分子沉淀剂 基质干扰 |
| DOI：10.13222/j.cnki.dc.2017.02.003 |
| 分类号: |
| 基金项目: |
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| Anti-interference effect of polymeric precipitant on the substrate impurities in cosmetics during detection of preservatives by HPLC |
|
ZHANG Hua-jun, LIU Zhao, LIU Qi, ZHANG Rong
|
|
Beijing Institute For Drug Control
|
| Abstract: |
| Three kinds of cosmetic samples including cream, liquid and lotion were taken as objects of this study. The antiinterference
effect of polymeric precipitant on the substrate impurities in these cosmetics during detection of preservatives by HPLC
was investigated. The results showed that, a combination of zinc acetate and potassium ferrocyanide as polymeric precipitant could
effectively eliminate the substrate interference in the three kinds of cosmetic samples including cream, liquid and lotion. The peak
shapes of 12 preservatives were presented well, symmetry and completely separated from baseline without any peak interference. The
linearly correlation coefficient was all greater than 0.999 9. The RSD of the method was less than 2%. The range of recoveries was
between 90%～104%. |
| Key words: cosmetics preservative polymeric precipitant substrate impurities |
